UM  > INSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Status已發表Published
Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography
Li, M; Luo, W; Xu, J; Zhang, J; Ng, K. W.; Cheng, X
2022
Source PublicationMicroelectronic Engineering
ISSN0167-9317
Pages111722-111722
AbstractAs nanoimprint lithography provides promising potential in industrial manufacture, it is highly desirable to fabricate a flexible mold with good surface hardness and corrosion resistance. In this work, a nano-patterned template with amorphous surface was fabricated by magnetron sputtering and electrodeposition. The glassy structure imparted high affinity to oxygen with selective oxidation of Zr, Cu, and Al atoms in ambient atmosphere. These nanoimprint templates, having excellent flexibility, surface hardness, and environmental stability, combined with strong capability for constructing nanopatterns, are advantageous for high-resolution imprint lithography with good industrialization prospects.
KeywordImprint lithography Sputtering Electrodeposition Oxidation
URLView the original
Language英語English
The Source to ArticlePB_Publication
PUB ID62928
Document TypeJournal article
CollectionINSTITUTE OF APPLIED PHYSICS AND MATERIALS ENGINEERING
Corresponding AuthorLi, M; Cheng, X
Recommended Citation
GB/T 7714
Li, M,Luo, W,Xu, J,et al. Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography[J]. Microelectronic Engineering,2022:111722-111722.
APA Li, M,Luo, W,Xu, J,Zhang, J,Ng, K. W.,&Cheng, X.(2022).Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography.Microelectronic Engineering,111722-111722.
MLA Li, M,et al."Fabrication and oxidation of amorphous Zr-based alloy for imprint lithography".Microelectronic Engineering (2022):111722-111722.
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