In situ X-ray diffraction study of the formation of TiSi                        2                        -C49 phase from Ti-Si multilayers on Si(100)

doi:10.1016/0254-0584(94)01457-R

Residential College	false
Status	已發表Published
	In situ X-ray diffraction study of the formation of TiSi 2 -C49 phase from Ti-Si multilayers on Si(100)
	Sariel J.1; Chen H.3; Jongste J.F.2; Radelaar S.2
	1995
Source Publication	Materials Chemistry & Physics
ISSN	02540584
Volume	40 Issue:2 Pages:82-86
Abstract	The kinetics of the formation of a metastable TiSi -C49 phase from amorphous Ti-Si multilayers grown on Si(100) substrate has been studied using a time-resolved X-ray diffraction technique at elevated temperatures ranging from 270 to 310 °C. A linear position-sensitive proportional counter (PSPC) was used to simultaneously collect the (131) and (150) Bragg peaks of the C49 phase. The kinetics data were analyzed using the Johnson-Mehl-Avrami (JMA) equation. The Avrami exponent was found to be 2.0 ± 0.1; the reaction rate constants follow a familiar Arrhenius-type behavior resulting in an activation energy of 2.5 eV. Comparison of our X-ray results with kinetics data obtained by other means is discussed. © 1995.
Keyword	Titanium disilicide X-ray diffraction
DOI	10.1016/0254-0584(94)01457-R
URL	View the original
Language	英語English
Fulltext Access	View Full-Text via DOI View Full-Text via Web of Science View Full-Text via Scopus
Citation statistics	Cited Times [WOS]:2 [WOS Record] [Related Records in WOS]
Document Type	Journal article
Collection	University of Macau
Affiliation	1.Nuclear Research Center-Negev 2.Delft Institute of Microelectronics and Submicrontechnology - DIMES 3.University of Illinois at Urbana-Champaign
Recommended Citation GB/T 7714	Sariel J.,Chen H.,Jongste J.F.,et al. In situ X-ray diffraction study of the formation of TiSi 2 -C49 phase from Ti-Si multilayers on Si(100)[J]. Materials Chemistry & Physics,1995,40(2):82-86.
APA	Sariel J.,Chen H.,Jongste J.F.,&Radelaar S..(1995).In situ X-ray diffraction study of the formation of TiSi 2 -C49 phase from Ti-Si multilayers on Si(100).Materials Chemistry & Physics,40(2),82-86.
MLA	Sariel J.,et al."In situ X-ray diffraction study of the formation of TiSi 2 -C49 phase from Ti-Si multilayers on Si(100)".Materials Chemistry & Physics 40.2(1995):82-86.

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